50 Moganshan Lu, Building 0, 2nd floor
Shanghai, Shanghai

“Pathways” features the work of American photographer Mark Most. Mark’s work has won numerous awards in local and regional juried exhibits and has been featured in publications such as ‘Home & Garden’, ‘Décor’ and ‘The New York Times.’ His infrared’s ethereal glow and expanded light spectrum “allows you to see beyond what the human eye can normally see.”

Opening reception is Saturday, September 8, from 4 to 6 pm. This exhibit will run until September 22.

Official Website: http://www.twocitiesgallery.com

Added by everting on August 29, 2007

Interested 1